Laser and E-beam mask-to-silicon with Inverse Lithography Technology (ILT)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Pang, Linyong ^a   Shamma, Nader ^a,b   Rissman, Paul ^a   Abrams, Dan ^a  

^a Luminescent Technologies Inc   (United States)

^b CYPRESS SEMICONDUCTOR   (United States)

Author keywords

AttPSM; CoG; Inverse Lithography Technology (ILT); Lithography; Mask writing; OPC; RET

Indexed keywords

ATTPSM; COG; INVERSE LITHOGRAPHY TECHNOLOGY (ILT); MASK WRITING; OPC;

COMPUTATIONAL COMPLEXITY; ELECTRON BEAMS; FRACTURE; IMAGE QUALITY; LASER APPLICATIONS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

MASKS;

EID: 33644608165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632738     Document Type: Conference Paper

References (10)

1. B.E.A. Saleh and S.I. Sayegh, Reductions of errors of microphotographic reproductions by optical corrections of original masks, Optical Eng. Vol. 20 pp 781-784 (1981)
2. K.M. Nashold and B.E.A. Saleh, Image construction through diffraction-limited high-contrast imaging systems: an iterative approach, J. Opt. Soc. Am. A, vol. 2 p. 635 (1985)
3. Y. Liu and A. Zakhor, Optimal binary image design for optical lithography, Proc. SPIE Vol. 1264 pp 410-412 (1990)
4. Y. Liu and A. Zakhor, Binary and phase-shifting image design for optical lithography, Proc. SPIE Vol. 1463 pp 3 82-399 (1991)
5. Y-T Wang, Y.C. Pati, H. Watanabe and T. Kailath, Automated design of halftoned double-exposure phase-shifting masks, Proc. SPIE Vol. 2440 pp 290-301 (1995)
6. S-H Jang et. al, Manufacturability evaluation of model-based OPC masks, Proc. SPIE vol. 4889 p 520 (2002)
7. A. Rosenbluth et. al, Optimum mask and source patterns to print a given shape, JM3 vol. 1 pp 13-30 (2002)
8. T. Fuhner and A. Erdmann, Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm, Proc. SPIE Vol. 5754 pp 415-426 (2005)
9. C. Y. Hung, et. al, First 65nm Tape-Out Using Inverse Lithography Technology (ILT), to be published in the proceedings of this conference
10. C. Jackson, DUV laser lithography for photomask fabrication, Proc. SPIE vol. 5377 pp 1005-1016 (2004)