Dense OPC and verification for 45nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Cobb, Nicolas ^a   Dudau, Dragos ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Dense OPC; Dense simulation; OPC verification

Indexed keywords

COMPUTATIONAL COSTS; DENSE OPC; DENSE SIMULATION; OPC VERIFICATION;

ALGORITHMS; COMPUTATION THEORY; COST ACCOUNTING; FUNCTION EVALUATION; LITHOGRAPHY; MATHEMATICAL MODELS;

OPTICAL SYSTEMS;

EID: 33745782741     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659449     Document Type: Conference Paper

References (4)

1. N. Cobb, "Flexible sparse and dense OPC algorithms", SPIE volume 5853, pp 693-702, Photomask Japan conference, 2005
2. N. Cobb, Y. Granik, "Dense OPC for 65nm and below", SPIE 5992-181, BACUS Symposium on Photomask Technology, 2005
3. N. Cobb, A. Zakhor, "Fast Sparse Aerial Image Calculation for OPC", BACUS 1994, Proc. SPIE Vol. 2621, p. 534- 545, 1995
4. K. Adam, "Modeling of Electromagnetic Effects from Mask Topography at Full-Chip Scale", Proceedings of the SPIE, vol. 5754, pp. 498-505, 2005