Temperature effect and stress on microcrystalline silicon thin films deposited under high pressure plasma conditions

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 603-607

  Amanatides, E ^a   Katsia, E ^a   Mataras, D ^a   Soto, A ^b   Voyiatzis, G A ^b  

^a UNIVERSITY OF PATRAS   (Greece)

^b INSTITUTE OF COMPUTER SCIENCE   (Greece)

Author keywords

Amorphous silicon; Film stress; Microcrystalline silicon; Raman spectroscopy

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; DEPOSITION; PARTIAL PRESSURE; RAMAN SPECTROSCOPY; THERMODYNAMIC STABILITY;

CRYSTALLINITY; DEPOSITION RATE; FILM STRESS; MICROCRYSTALLINE SILICON;

THIN FILMS;

EID: 33747418484     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.121     Document Type: Article

References (16)

1. Vetterl O., Finger F., Carius R., Hapke P., Houben L., Kluth O., Lambertz A., Muck A., Rwch B., and Wagner H. Sol. Energy Mater. Sol. Cells 62 (2000) 97
2. Touir H., Dixmier J., Zellama K., Morhange J.-F., and Elkaim P. J. Non-Cryst. Solids 227-230 (1998) 906
3. Gogotsi Y., Baek C., and Kirscht F. Semicond. Sci. Technol. 14 (1999) 936
4. Vingoli S., Butte R., Meaudre R., Meaudre M., and Brenier R. J. Phys., Condens. Matter 15 (2003) 7185
5. Concari S.B., and Buitrago R.H. Semicond. Sci. Technol. 18 (2003) 864
6. Tsu R., and Hernandez J.G. Appl. Phys. Lett. 41 (1982) 1016
7. Paillard V., Puech P., Sirvin R., Hamma S., and Roca i Cabarrocas P. J. Appl. Phys. 90 (2001) 3276
8. Viera G., Huet S., and Boufendi L. J. Appl. Phys. 90 (2001) 3276
9. Roschek T., Repmann T., Müller J., Rech B., and Wagner H. J. Vac. Sci. Technol., A 20 (2002) 492
10. Kondo M., Fukawa M., Guo L., and Matsuda A. J. Non-Cryst. Solids 266-269 (2000) 84
11. Spiliopoulos N., Mataras D., and Rapakoulias D.E. J. Vac. Sci .Technol., A 14 (1996) 2757
12. Amanatides E., Stamou S., Boghosian S., and Mataras D. Proceedings of the 16th European Photovoltaic Solar Energy Conference, Glasgow, UK vol. 1 (2000) 581
13. Amanatides E., Hammad A., Katsia E., and Mataras D. J. Appl. Phys. 97 (2005) 073303
14. Katsia E., Amanatides E., Mataras D., Soto A., and Voyiatzis G.A. Sol. Energy Mater. Sol. Cells 87 (2005) 157
15. Cerquira M.F., and Ferreira J.A. J. Mater. Process. Technol. 92-93 (1999) 235
16. De Wolf I. Semicond. Sci. Technol. 11 (1996) 139