Raman monitoring laser-induced phase transformation in microcrystalline silicon thin films prepared by PECVD

Semiconductor Science and Technology

Volumn 18, Issue 9, 2003, Pages 864-869

  Concari, S B ^a   Buitrago, R H ^a,b  

^a UNIVERSIDAD NACIONAL DEL LITORAL   (Argentina)

^b Instituto de Desarrollo Tecnologico para la Industria Quimica   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; GRAIN SIZE AND SHAPE; HYDROGENATION; LASERS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILANES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DARK CODUCTIVITY;

SEMICONDUCTING SILICON;

EID: 0141857593     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/18/9/309     Document Type: Article

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