DC magnetron sputtering of Si to form SiO2 in low-energy ion beam

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 693-697

  Lee, Cheng Chung ^a   Jan, Der Jun ^a,b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Ion beam; Magnetron sputtering; Optical properties

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; SILICON; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DC MAGNETRON SPUTTERING; ION-BEAM OXIDATION (IBO); OXYGEN RATIO;

SILICA;

EID: 33747410106     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.026     Document Type: Article

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