Metal deposition and oxygen-ion implantation for optical thin films

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 449-454

  Chiba, S ^a,b   Motoki, A ^b   Fujikura, K ^b   Hata, T ^a  

^a KANAZAWA UNIVERSITY   (Japan)

^b CBC INGS Co Ltd   (Japan)

Author keywords

High rate deposition; Low temperature; Optical thin films; Reactive deposition; Sputtering

Indexed keywords

ANTIREFLECTION COATINGS; ION IMPLANTATION; OPTICAL FILMS; OXIDATION; PLASMA APPLICATIONS; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL);

HIGH RATE DEPOSITION; LOW TEMPERATURE DEPOSITION; OPTICAL THIN FILMS; REACTIVE DEPOSITION;

THIN FILMS;

EID: 2442589403     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.074     Document Type: Article

References (5)

1. Hichwa BP. Proceedings of the Second International Symposium on Sputtering and Plasma Processes, 1993. p. 61.
2. Schiller S, Goedicke K, Kirchhoff V, Kopte T. Proceedings of the 38th Annual Technical Conference, 1995. p. 293.
3. Song Y., Sakurai T., Maruta K., Matsusita A., Matsumoto S., Saisho S., Kikuchi K. Vacuum. 59:2000;755-763.
4. Hata T, Motoki A, Chiba S, Takahashi M, Kinokiri K, Itou A, Hamano M. Japan Patent (Open No.), 2002:256429.
5. Macleod M.A. Thin-film optical filters. 2nd ed:1986;Macmillan, New York.