Polyelectrolyte brushes as efficient ultrathin platforms for site-selective copper electroless deposition

Langmuir

Volumn 22, Issue 16, 2006, Pages 6730-6733

  Azzaroni, Omar ^a   Zheng, Zijian ^a   Yang, Zhongqiang ^a   Huck, Wilhelm T S ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; DELAMINATION; ELECTROLESS PLATING; REACTION KINETICS; ULTRATHIN FILMS;

METAL FILM; POLYELECTROLYTE BRUSHES; SITE-SELECTIVE COPPER ELECTROLESS DEPOSITION;

POLYELECTROLYTES;

EID: 33747177411     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la060891+     Document Type: Article

References (35)

1. Vargo, T. G.; Gardella, J. A., Jr.; Calvert, J. M.; Chen, M.-S. Science 1993, 262, 1711-1712.
2. Dugasz, J.; Szasz, A. Surf. Coat. Technol. 1993, 58, 57-62.
3. Zouhou, A.; Vergnes, H.; Duverneil. P. Microelectron. Eng. 2001, 56, 177-180.
4. Sacham-Diamand, Y.; Dubin, V. M. Microelectron. Eng. 1997, 33, 47-58.
5. Pan, C. T. Microelectron. Eng 2004, 71, 242-251.
6. Wang, W. C.; Kang, E. T.; Neoh, K. G. Appl. Surf. Sci. 2002, 199, 52-66.
7. Xu, L.; Liao, J.; Huang, L.; Gu, N.; Zhang, H.; Liu, J. Appl. Surf. Sci. 2003, 211, 184-188.
8. Xu, L.; Liao, J.; Huang, L.; Ou, D.; Guo, Z.; Zhang, H.; Ge, C.; Gu, N.; Liu, J. Thin Solid Films 2003, 434, 121-125.
9. Schlesinger, M.; Paunovic, M. In Modern Electroplating, 4th ed.; Wiley-Interseience; New York, 2000.
10. (a) Dressick, W. J.; Chen, M.-S.; Brandow, S. L. J. Am. Chem. Soc. 2000, 122, 982-983.
11. (b) Dressick, W. J.; Chen, M. S.; Brandow, S. L.; Rhee, K. W.; Shirey, L. M.; Perkins, F. K. Appl. Phys. Lett. 2001, 78, 676-678.
12. (a) Dressick, W. J.; Dulcey, C. S.; Georger, J. H., Jr.; Calabrese, G. S.; Calvert, J. M. J. Electrochem. Soc. 1997, 144, 3425-3434.
13. (b) Brandow, S. L.; Chen, M.-S.; Aggarwal, R.; Dulcey, C. S.; Calvert, J. M.; Dressick, W. J. Langmuir 1999, 15, 5429-5432.
14. (c) Chen, M.-S.; Brandow, S. L.; Schull, T. L.; Chrisey, D. B.; Dressick, W. J. Adv. Funct. Mater. 2005, 15, 1364-1375.
15. Chen, M.-S.; Dulcey, C. S.; Chrisey, L. A.; Dressick, W. J. Adv. Func. Mater. 2006, 16, 774-783.
16. Hozumi, A.; Asakura, S.; Fuwa, A.; Shirahata, N.; Kameyama, T. Langmuir 2005, 21, 8234-8242.
17. Shah, P.; Kevrekidis, Y.; Benzinger, J. Langmuir 1999, 15, 1584-1687.
18. Cheng, K.; Yang, M.-H.; Chiu, W. W. W.; Huang, C.-Y.; Chang, J.; Ying, T.-F.; Yang, Y. Macromol. Rapid Commun. 2005, 26, 247-264.
19. Hidber, P. C.; Helbig, W.; Kim, E.; Whitesides, G. M. Langmuir 1996, 12, 1375-1380.
20. Kind, H.; Geissler, M.; Schmid, H.; Michel, B.; Kern, K.; Delamarche, E. Langmuir 2000, 16, 6367-6373.
21. Wu, X. C.; Bittner, A. M.; Kern, K. Langmuir 2002, 18, 4984-4988.
22. Bittner, A. M.; Wu, X. C.; Kern, K. Adv. Funct. Mater. 2002, 12, 432-436.
23. Kind, H.; Bittner, A. M.; Cavalleri, O.; Kern, K.; Greber, T. J. Phys. Chem. B 1998, 102, 7582-7589.
24. Wang, T. C.; Chen, B.; Rubner, M. F.; Cohen, R. E. Langmuir 2001, 17, 6610-6615.
25. Xia, Y.; Whitesides, G. M. Angew. Chem., Int. Ed. Engl. 1998, 37, 550-575.
26. Michel, B.; Bernard, A.; Delamarche, E.; Geissler, M.; Juncker, D.; Kind, H.; Renault, J.-P.; Rothuizen, H.; Schmid, H.; Schimdt-Winkel, P.; Stutz, H.; Wolf. IBM J. Res. Dev. 2001, 45, 687-719.
27. Hammond, P. T. Adv. Mater. 2004, 16, 1271-1293.
28. Park, J.; Hammond, P. T. Adv. Mater. 2004, 16, 520-525.
29. Moya, S. E.; Brown, A. A.; Azzaroni, O.; Huck, W. T. S. Macromol. Rapid Commun. 2005, 26, 1117-1121.
30. Azzaroni, O.; Moya, S. E.; Farhan, T.; Brown, A. A.; Huck, W. T. S. Macromolecules 2005, 38, 10192-10199.
31. Moya, S. E.; Azzaroni, O.; Farhan, T.; Osborne, V. L.; Huck, W. T. S. Angew. Chem., Int. Ed. 2005, 44, 4578-4581.
32. Pyun, J.; Kowaleski, T.; Matyjaszewski, K. Macromol. Rapid. Commun. 2003, 24, 1043-1059.
33. Patten, T. E.; Xia, J.; Abermathy, T.; Matyjaszewski, K. Science 1996, 272, 866-868.
34. Azzaroni, O.; Moya, S. E.; Brown, A. A.; Zheng, Z.; Donath, E.; Huck, W. T. S. Adv. Funct. Mater. 2006, 16, 1037-1042.
35. Baker, L. A.; Zamborini, F. P.; Sun, L.; Crooks, R. M. Anal. Chem. 1999, 71, 4403-4406.