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Volumn 252, Issue 20, 2006, Pages 7343-7346

Direct writing of microtunnels using proton beam micromachining

Author keywords

Ion beam lithography; Micromachining; Microtunnels; PMMA

Indexed keywords

ASPECT RATIO; ELECTROFORMING; ION BEAM LITHOGRAPHY; MICROMACHINING; MOLDING; POLYMETHYL METHACRYLATES; X RAY LITHOGRAPHY;

EID: 33747159345     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.106     Document Type: Article
Times cited : (10)

References (12)
  • 1
    • 0035875716 scopus 로고    scopus 로고
    • Why light ions in future ion lithography?
    • Vutova K., and Mladenov G. Why light ions in future ion lithography?. Vacuum 62 (2001) 273-278
    • (2001) Vacuum , vol.62 , pp. 273-278
    • Vutova, K.1    Mladenov, G.2
  • 2
    • 0013095330 scopus 로고    scopus 로고
    • Deep X-ray lithography for the fabrication of microstructures at ELSA
    • Pantenburg F.J., and Mohr J. Deep X-ray lithography for the fabrication of microstructures at ELSA. Nucl. Instrum. Meth. A 467-468 (2001) 1269-1273
    • (2001) Nucl. Instrum. Meth. A , vol.467-468 , pp. 1269-1273
    • Pantenburg, F.J.1    Mohr, J.2
  • 3
    • 0033323257 scopus 로고    scopus 로고
    • Focused high energy proton beam micromachining: a perspective view
    • Watt F. Focused high energy proton beam micromachining: a perspective view. Nucl. Instrum. Meth. B 158 (1999) 165-172
    • (1999) Nucl. Instrum. Meth. B , vol.158 , pp. 165-172
    • Watt, F.1
  • 12
    • 33747166911 scopus 로고    scopus 로고
    • J.F. Ziegler, SRIM-2000 computer code. http://www.srim.org/.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.