New developments on the Surrey microbeam applications to lithography

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 231, Issue 1-4, 2005, Pages 428-432

  Mistry, P ^a   Gomez Morilla, I ^a   Grime, G W ^a   Webb, R ^a   Jeynes, C ^a   Gwilliam, R ^a   Cansell, A ^a   Merchant, M ^a   Kirkby, K J ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

GaAs; PMMA; Proton beam lithography

Indexed keywords

ASPECT RATIO; POLYMETHYL METHACRYLATES; PROTON BEAMS; SEMICONDUCTING GALLIUM ARSENIDE;

HIGH ASPECT RATIO; PROTON BEAM LITHOGRAPHY;

LITHOGRAPHY;

EID: 33644558054     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.01.095     Document Type: Conference Paper

References (5)

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2. M.B.H. Breese, G.W. Grime, and F. Watt Nucl. Instr. and Meth. B 77 1993 169
3. J.A. Van Kan, J.L. Sanchez, B. Xu, T. Osipowicz, and F. Watt Nucl. Instr. and Meth. B 148 1999 1085
4. E.J. Teo, M.B.H. Breese, E.P. Tavernier, A.A. Bettiol, F. Watt, M.H. Liu, and D.J. Blackwood Appl. Phys. Lett. 84 17 2004
5. A. Bettiol, C.N.B. Udalagama, J.A. van Kan, F. Watt, Ionscan: Proton beam writing scan and control software, Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 1st International Workshop on Proton Beam Writing 18-22nd July 2004, Singapore