Growth and characterization of SiON thin films by using thermal-CVD machine

Optical Materials

Volumn 25, Issue 1, 2004, Pages 1-7

  Pandey, R K ^a   Patil, L S ^a   Bange, J P ^a   Patil, D R ^a   Mahajan, A M ^a   Patil, D S ^a   Gautam, D K ^a  

^a NORTH MAHARASHTRA UNIVERSITY   (India)

Author keywords

Characterization; Dielectric films; DMDS; FTIR; SiON; Thermal CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS;

DEPOSITION TEMPERATURE;

THIN FILMS;

EID: 0347024128     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2003.07.003     Document Type: Article

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