SCOPUS 정보 검색 플랫폼

Volumn 174-175, Issue , 2003, Pages 166-169

N2 doped SiO2-SiON planar waveguides deposited by PECVD method

Author keywords

Optical properties; Plasma enhanced chemical vapor deposition; Silicon dioxide; Silicon oxynitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICA; THICK FILMS;

PLANAR LIGHTWAVE CIRCUITS (PLC);

OPTICAL WAVEGUIDES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 4644345931 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00603-0 Document Type: Article

Times cited : (12)

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