Reversible electromigration of thallium adatoms on the Si(1 1 1) surface

Surface Science

Volumn 600, Issue 15, 2006, Pages 189-193

  Visikovskiy, Anton ^a,b   Mizuno, Seigi ^a   Tochihara, Hiroshi ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b INSTITUTE OF AUTOMATION AND CONTROL PROCESSES   (Russian Federation)

Author keywords

Electromigration; Low energy electron diffraction (LEED); Semiconducting surfaces; Silicon; Thallium

Indexed keywords

ELECTRIC FIELDS; ELECTROMIGRATION; ELECTRON DIFFRACTION; LOW ENERGY ELECTRON DIFFRACTION; SWITCHING; THALLIUM;

POLARITY; REVERSIBLE ELECTROMIGRATION; SEMICONDUCTING SURFACES;

SEMICONDUCTING SILICON;

EID: 33746012957     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.05.039     Document Type: Article

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