Scattering patterns and energy distribution of scattered electrons under field emission conditions of scanning tunneling microscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5501-5505

  Mizuno, Seigi ^a,b   Fukuda, Jun ^a   Iwanaga, Masayuki ^a   Tochihara, Hiroshi ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Field emission; Low energy electron diffraction; Scanning tunneling microscopy

Indexed keywords

BACKSCATTERING; CAMERAS; CHARGE COUPLED DEVICES; ELECTRON BEAMS; ELECTRON EMISSION; ETCHING; IMAGING TECHNIQUES; KINETIC ENERGY; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE;

FIELD EMISSION; FIELD EMISSION SCANNING AUGER ELECTRON MICROSCOPY (FES-AM); LOW-ENERGY ELECTRON DIFFRACTION; MAGNETIC IMAGING;

ELECTRON SCATTERING;

EID: 6344280760     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5501     Document Type: Article

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