Ion bombardment effects on nucleation of sputtered Mo nano-crystals in Mo/B4C/Si multilayers

Surface and Coatings Technology

Volumn 201, Issue 1-2, 2006, Pages 143-147

  Patelli, A ^a   Rigato, V ^a   Salmaso, G ^a   Carvalho, N J M ^b   De Hosson, J Th M ^b   Bontempi, E ^c   Depero, L E ^c  

^a LABORATORI NAZIONALI DI LEGNARO   (Italy)

^b UNIVERSITY OF GRONINGEN   (Netherlands)

^c UNIVERSITY OF BRESCIA   (Italy)

Author keywords

Crystal microstructure; EUV multilayer mirrors; Molybdenum; Nucleation; Silicon

Indexed keywords

CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; MIRRORS; MOLYBDENUM; NUCLEATION; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

BARRIER LAYERS; ION BOMBARDMENT EFFECTS; MULTILAYER MIRRORS; SPUTTERED NANO-CRYSTALS;

NANOSTRUCTURED MATERIALS;

CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; MIRRORS; MOLYBDENUM; NANOSTRUCTURED MATERIALS; NUCLEATION; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 33745941101     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.072     Document Type: Article

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