Laser bandwidth and other sources of focus blur in lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Brunner, T ^a   Corliss, D ^a   Butt, S ^a   Wiltshire, T ^a   Ausschnitt, C P ^a   Smith, M ^b  

^a IBM   (United States)

^b KLA Tencor Austin   (United States)

Author keywords

Excimer laser; High NA imagery; High resolution lithography; Laser bandwidth; Linewidth uniformity; Lithography; Microlithography; Process control; Proximity effects; Simulation

Indexed keywords

HIGH NA IMAGERY; HIGH RESOLUTION LITHOGRAPHY; LASER BANDWIDTH; LINEWIDTH UNIFORMITY; PROXIMITY EFFECTS;

BANDWIDTH; COMPUTER SIMULATION; EXCIMER LASERS; MATHEMATICAL MODELS; PROCESS CONTROL;

LITHOGRAPHY;

EID: 33745790897     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656520     Document Type: Conference Paper

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