Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6 Na KrF imaging

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 992-999

  Lalovic, Ivan ^a   Kroyan, Armen ^a   Zambon, Paolo ^a   Silsby, Christopher ^b   Farrar, Nigel ^a  

^a CYMER INC   (United States)

^b AGILENT TECHNOLOGIES   (United States)

Author keywords

Chromatic aberrations; Excimer laser bandwidth; Lithography; Mask error enhancement factor; Optical proximity correction

Indexed keywords

ABERRATIONS; BANDWIDTH; COMPUTER SIMULATION; ERROR ANALYSIS; EXCIMER LASERS; IMAGING SYSTEMS; PHOTORESISTS;

OPTICAL PROXIMITY CORRECTIONS (OPC);

MASKS;

EID: 0035763812     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458263     Document Type: Article

References (6)

1. A. Kroyan, I. Lalovic, N.R. Farrar, "Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging," Proc. SPIE Optical Microlithography XIV 4346, 1244 (2001).
2. PROLITH/2 and Klarity ProDATA are registered trademarks of KLA-Tencor, San Jose, CA.
3. A. Kroyan, J.J. Bendik, O. Semprez, N.R. Farrar, C.G. Rowan, C.A. Mack, "Modeling the effects of excimer laser bandwidths on lithographic performance," Proc. SPIE Optical Microlithography XIII 4000, 658 (2000).
4. M. Terry, I. Lalovic, G. Wells, A.H. Smith, "Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners," Proc. SPIE Optical Microlithography XIV 4346, 15 (2001).
5. I. Lalovic, A. Kroyan, N.R. Farrar, P. Zambon, A.H. Smith, "Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth," Proc. SPIE Optical Microlithography XIV 4346, 1262 (2001).
6. A. Kroyan, I. Lalovic, N.R. Farrar, "Contribution of polychromatic illumination to optical proximity effects in the context of deep-UV lithography," presented at BACUS XXI Photomask Technology Symp., Oct. 2-5, 2001.