Contribution of polychromatic illumination to optical proximity effects in the context of deep-UV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 1112-1120

  Kroyan, Armen ^a   Lalovic, Ivan ^a   Farrar, Nigel ^a  

^a CYMER INC   (United States)

Author keywords

Chromatic aberrations; Laser bandwidth; Optical proximity effects

Indexed keywords

ABERRATIONS; BANDWIDTH; COMPUTER SIMULATION; EXCIMER LASERS; PHOTOLITHOGRAPHY;

POLYCHROMATIC ILLUMINATION;

PROJECTION SYSTEMS;

EID: 0035768142     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458276     Document Type: Article

References (5)

1. A. Kroyan et al., "Modeling the Effects of Excimer Laser Bandwidths on Lithographic Performance," Proc. SPIE, Vol. 4000, pp. 658-664, 2000.
2. A. Kroyan et al., "Effects of 95% Integral vs. FWHM Bandwidth Specifications on Lithographic Imaging," Proc. SPIE, Vol. 4346, 2001.
3. M. Terry et al., "Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners," Proc. SPIE, Vol. 4346, 2001.
4. I. Lalovic et al., "Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth," Proc. SPIE, Vol. 4346, 2001.
5. U.P. Schroeder et al., "Structure End Foreshortening: Lithography Driven Design Limitations," Proc. SPIE, Vol. 4000, pp. 974-981, 2000.