Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1262-1271

  Lalovic, Ivan ^a   Kroyan, Armen ^a   Farrar, Nigel ^a   Taitano, Dennis ^a,b   Zambon, Paolo ^a   Smith, Adlai ^a,c  

^a CYMER INC   (United States)

^b KLA TENCOR CORPORATION   (United States)

^c Litel Instruments   (United States)

Author keywords

Aberration; Excimer laser; Lithography; Spectral bandwidth; Zernike

Indexed keywords

ABERRATIONS; BANDWIDTH; COHERENT LIGHT; EXCIMER LASERS; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; SPECTRUM ANALYSIS; WAVEFRONTS;

LITHOGRAPHIC EXPOSURE SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0035758526     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435655     Document Type: Article

References (18)

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