Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1244-1253

  Kroyan, Armen ^a   Lalovic, Ivan ^a   Farrar, Nigel ^a  

^a CYMER INC   (United States)

Author keywords

Aerial image; Chromatic aberration; Laser bandwidth

Indexed keywords

ABERRATIONS; BANDWIDTH; COMPUTER SIMULATION; IMAGING TECHNIQUES; LASER APPLICATIONS; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION;

LITHOGRAPHIC IMAGING;

PHOTOLITHOGRAPHY;

EID: 0035758816     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435661     Document Type: Article

References (7)

1. A. Kroyan et. al., "Modeling the Effects of Excimer Laser Bandwidths on Lithographic Performance," Proc. SPIE, Vol. 4000, pp. 658-664, 2000.
2. FINLE Technologies, Inc., Austin, TX.
3. P. Yan, Q. Qian, J. Langston, and P. Leon, "Effects of chromatic aberration in excimer laser lithography," Proc. SPIE, Vol. 1674, pp. 316-327, 1992.
4. N. R. Farrar et. al., "In-situ measurement of lens aberrations," Proc. SPIE, Vol.4000, pp. 18-29, 2000.
5. M. Terry, I. Lalovic, G. Wells, and A. Smith, "Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners," Proc. SPIE, Vol. 4346, 2001.
6. A. Ershov, et. al., "Novel metrology for measuring spectral purity of KrF lasers for deep UV lithography," Proc. SPIE, Vol. 3677, pp. 611-620.
7. A. Ershov, et. al., "Laser spectrum line shape metrology at 193 nm," Proc. SPIE, Vol. 4000, pp. 1405-1417, 2000.