Identification of nanoscale dissipation processes by dynamic atomic force microscopy

Physical Review Letters

Volumn 97, Issue 1, 2006, Pages

  Garcia, R ^a   Gomez C J ^a   Martinez, N F ^a   Patil, S ^a   Dietz, C ^b   Magerle, R ^b  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLITUDE MODULATION; ATOMIC FORCE MICROSCOPY; ENERGY DISSIPATION; HYSTERESIS; INTERFACIAL ENERGY; OSCILLATIONS; POLYSTYRENES; SILICON; SURFACE PROPERTIES; VISCOELASTICITY;

AMPLITUDE-MODULATION ATOMIC FORCE MICROSCOPY; NANOSCALE DISSIPATION PROCESS; OSCILLATION AMPLITUDE; SURFACE ENERGY HYSTERESIS;

NANOTECHNOLOGY;

EID: 33745769316     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.97.016103     Document Type: Article

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