Effect of the initial thin Ti buffer layers on the quality of ZnO thin films grown on Si(111) substrates by MOCVD

Superlattices and Microstructures

Volumn 40, Issue 1, 2006, Pages 56-63

  Li, Fan ^a   Li, Dongmei ^a   Dai, Jiangnan ^a   Su, Hongbo ^a   Wang, Li ^a   Pu, Yong ^a   Fang, Wenqing ^a   Jiang, Fengyi ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

Metal organic chemical vapor deposition; Si substrate; Ti; ZnO

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; TITANIUM; X RAY DIFFRACTION; ZINC OXIDE;

EXCITONIC EMISSIONS; INTERFERENCE MICROSCOPY; MICROSCOPIC IMAGES; SI SUBSTRATES;

THIN FILMS;

EID: 33745749336     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2006.05.001     Document Type: Article

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