Annealing effect for structural morphology of ZnO film on SiO2 substrates

Materials Science in Semiconductor Processing

Volumn 7, Issue 1-2, 2004, Pages 1-6

  Kim, Hyoun Woo ^a   Kim, Nam Ho ^a  

^a Inha University   (South Korea)

Author keywords

Sputtering; Structural properties; Thin films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; MORPHOLOGY; PULSED LASER DEPOSITION; STRUCTURE (COMPOSITION); SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ANNEALING TEMPERATURE; ION BEAM DEPOSITION; STRUCTURAL PROPERTIES;

SILICA;

EID: 3242882318     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2003.12.001     Document Type: Article

References (21)

1. Yamamoto T., Shiosaki T., Kawabata A. J Appl Phys. 51:1980;3113.
2. Ondo-Ndong R., Pascal-Delannoy F., Boyer A., Giani A., Foucaran A. Mater Sci Eng. B97:2003;68.
3. Lee J-.H., Ko K-.H., Park B-.O. J Cryst Growth. 247:2003;119.
4. Ayouchi R., Martin F., Leinen D., Ramos-Barrado J.R. J Cryst Growth. 247:2003;497.
5. Lokhande B.J., Patil P.S., Uplane M.D. Mater Lett. 57:2002;573.
6. Zeng J.N., Low J.K., Ren Z.M., Liew T., Lu Y.F. Appl Surf Sci. 197:2002;362.
7. Kim H., Horwitz J.S., Qadri S.B., Chrisey D.B. Thin Solid Film. 420:2002;107.
8. Whangbo S.W., Jang H.K., Kim S.G., Cho M.H., Jeong K.H., Whang C.N. J Korean Phys Soc. 37:2000;456.
9. Li B.S., Liu Y.C., Shen D.Z., Zhang J.Y., Lu Y.M., Fan X.Q. J Cryst Growth. 249:2003;179.
10. Yamada A., Sang B., Konagai M. Appl Surf Sci. 112:1997;216.
11. Xu X.L., Lau S.P., Chen J.S., Sun Z., Tay B.K., Chai J.W. Mater Sci Semicond Proc. 4:2001;617.
12. Gordillo G., Calderon C. Sol Energy Mater Sol Cells. 69:2001;251.
13. Du G., Wang J., Wang X., Jiang X., Yang S., Ma Y., Yan W., Gao D., Liu X., Cao H., Xu J., Chang R.P.H. J Cryst Growth. 243:2003;439.
14. Ye J., Gu S., Zhu S., Chen T., Hu L., Qin F., Zhang R., Shi Y., Zheng Y. J Cryst Growth. 243:2002;151.
15. Iwata K., Fons P., Niki S., Yamada A., Matsubara K., Nakahara K., Tanabe T., Takasu H. J Cryst Growth. 214/215:2000;50.
16. Guha S., Bojarczuk N.A. Appl Phys Lett. 73:1998;1487.
17. Lu Y.M., Hwang W.S., Liu W.Y., Yang J.S. Mater Chem Phys. 72:2001;269.
18. Ogata K., Sakurai K., Fujita Sz., Fujita Sg., Matsushige K. J Cryst Growth. 214/215:2000;312.
19. Cullity B.D. Elements of X-ray diffraction. 2nd ed:1978;Addison-Wesley, Reading, MA.
20. Fujimura N., Nishihara T., Goto S., Xu J., Ito T. J Cryst Growth. 130:1993;269.
21. Porter D.A., Easterling K.E. Phase transformations in metals and alloys. 1981;Van Nostrand Reinhold, New York.