Structural and luminescent properties of ZnO epitaxial film grown on Si(1 1 1) substrate by atmospheric-pressure MOCVD

Journal of Crystal Growth

Volumn 275, Issue 3-4, 2005, Pages 486-491

  Chen, Yufeng ^a   Jiang, Fengyi ^a   Wang, Li ^a   Zheng, Changda ^a   Dai, Jiangnan ^a   Pu, Yong ^a   Fang, Wenqing ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

A1. Atmospheric pressure metalorganic chemical vapor deposition (AP MOCVD); A1. Photoluminescence; A1. Si substrate; B1. ZnO

Indexed keywords

EPITAXIAL GROWTH; EXCITONS; LUMINESCENCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; SURFACE PROPERTIES; ZINC OXIDE;

ATMOSPHERIC-PRESSURE METALORGANIC CHEMICAL VAPOR DEPOSITION; DIFFRACTION PEAK; SI SUBSTRATE; ZNO;

THIN FILMS;

EID: 14844340176     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.12.019     Document Type: Article

References (21)

1. Z.K. Tang, G.K.L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa Appl. Phys. Lett. 72 1998 3270
2. Y. Chen, D.M. Bagnall, Z. Zhu, T. Sekiuchi, K.-T. Park, K. Hiraga, T. Yao, S. Koyama, M.-Y. Shen, and T. Goto J. Crystal Growth 181 1997 165
3. M.A.L. Johnson, S. Fujita, W.H. Rowland Jr., W.C. Hughes, J.W. Cook, and J.F. Schetzina J. Electron. Mater. 25 1996 855
4. A. Ohtomo, K. Tamura, K. Saikusa, K. Takahashi, T. Makino, Y. Segawa, H. Koinuma, and M. Kawasaki Appl. Phys. Lett. 75 1999 2635
5. M. Purica, E. Budianu, E. Rusu, M. Danila, and R. Gavrila Thin Solid Films 403/404 2002 485
6. B.S. Li, Y.C. Liu, Z.Z. Zhi, D.Z. Shen, Y.M. Lu, J.Y. Zhang, X.G. Kong, and X.W. Fan Thin Solid Films 414 2002 170
7. Y. Chen, F. Jiang, L. Wang, C. Mo, Y. Pu, and W. Fang J. Crystal Growth 268 2004 71
8. F.K. Shan, B.C. Shin, S.W. Jang, and Y.S. Yu J. Eur. Ceram. Soc. 24 2004 1015
9. T.W. Kim, K.H. Lee, H.S. Lee, J.Y. Lee, S.G. Kang, D.W. Kim, and W.J. Cho J. Crystal Growth 262 2004 72
10. K. Ogata, S.-W. Kim, Sz. Fujita, and Sg. Fujita J. Crystal Growth 240 2002 112
11. Z. Fu, B. Lin, and J. Zu Thin Solid Films 402 2002 302
12. N. Kawamoto, M. Fujita, T. Tatsumi, and Y. Horikoshi Jpn. J. Appl. Phys. Part 1 42 2003 7209
13. J.H. Choi, H. Tabata, and T. Kawai J. Crystal Growth 226 2001 493
14. K. Iwata, P. Fons, S. Niki, A. Yamada, K. Matsubara, K. Nakahara, T. Tanabe, and H. Takasu J. Crystal Growth 214/215 2000 50
15. S.J. Chen, Y.C. Liu, J.G. Ma, D.X. Zhao, Z.Z. Zhi, Y.M. Lu, J.Y. Zhang, D.Z. Shen, and X.W. Fan J. Crystal Growth 240 2002 467
16. A. Miyake, H. Kominami, H. Tatsuoka, H. Kuwabara, Y. Nakanishi, and Y. Hatanaka J. Crystal Growth 214/215 2000 294
17. N. Oleynik, A. Dadgar, J. Blasing, M. Adam, and A. Krtschil Jpn. J. Appl. Phys. Part1 42 2003 7474
18. S.-H. Jeong, I.-S. Kim, J.-K. Kim, and B.-T. Lee J. Crystal Growth 26 2004 327
19. J.F. Yan, Y.M. Lu, Y.C. Liu, H.W. Liang, B.H. Li, D.Z. Shen, J.Y. Zhang, and X.W. Fan J. Crystal Growth 266 2004 505
20. S.-K. Kim, S.-Y. Jeong, and C.-R. Cho Appl. Phys. Lett. 82 2003 562
21. O. Madelung Numerical Data and Functional Relationships in Science and Technology vol. 176 1982 Springer Heideberg p. 45