Repairing of etching-induced damage of high-k Ba0.5Sr 0.5TiO3 thin films by oxygen surface plasma treatment

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5490-5494

  Tsai, Kou Chiang ^a,b   Wu, Wen Fa ^b   Chao, Chuen Guang ^a   Lee, Jain Tsai ^a   Hsu, Jwo Lun ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

BST films; Etching residues; Helicon wave plasma; Oxygen plasma treatment

Indexed keywords

CURRENT DENSITY; ION BOMBARDMENT; LEAKAGE CURRENTS; RADIATION DAMAGE; REACTION KINETICS; SUBSTRATES; THIN FILMS; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

BST FILMS; ETCHING RESIDUES; HELICON-WAVE PLASMAS SYSTEMS; OXYGEN PLASMA TREATMENTS;

PLASMA ETCHING;

EID: 33745674288     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5490     Document Type: Review

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