Study of damage reduction of (Ba0.6, Sr0.4)TiO3 thin films etched in Ar/CF4 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1469-1474

  Kang, Pil Seung ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; BARIUM COMPOUNDS; CONTAMINATION; CURRENT DENSITY; DESORPTION; ETCHING; FLUORINE COMPOUNDS; LEAKAGE CURRENTS; PLASMAS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

BARIUM STRONTIUM TITANATE; LEAKAGE CURRENT DENSITY; METAL FLUORIDES; PLASMA INDUCED DAMAGE;

THIN FILMS;

EID: 0041733686     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1568744     Document Type: Article

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