Abatement of PFCs from semiconductor manufacturing processes by nonthermal plasma technologies: A critical review

Industrial and Engineering Chemistry Research

Volumn 45, Issue 12, 2006, Pages 4101-4109

  Chang, Moo Been ^a   Chang, Jen Shih ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AIR POLLUTION; ENVIRONMENTAL IMPACT; GASEOUS EFFLUENTS; GREENHOUSE EFFECT; INDUSTRIAL EMISSIONS; PLASMA APPLICATIONS; SEMICONDUCTOR MATERIALS;

GASEOUS POLLUTANTS; NONTHERMAL PLASMAS (NTP); PERFLUOROCOMPOUNDS (PFC); SEMICONDUCTOR MANUFACTURING PROCESSES;

POLLUTION CONTROL;

AIR POLLUTION; ENVIRONMENTAL IMPACT; GASEOUS EFFLUENTS; GREENHOUSE EFFECT; INDUSTRIAL EMISSIONS; PLASMA APPLICATIONS; POLLUTION CONTROL; SEMICONDUCTOR MATERIALS;

EID: 33745636587     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie051227b     Document Type: Review

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