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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 6413-6417

Organic film reactive ion etching using 100 MHz rf capacitive coupled plasma

(5) Ohiwa, Tokuhisa a Hayashi, Hisataka a Sakai, Itsuko a Kojima, Akihiro a Shinomiya, Eiichiro a

a TOSHIBA CORPORATION (Japan)

Author keywords

Organic film; Reactive ion etching; Rf frequency; RIE; Self bias voltage

Indexed keywords

ARGON; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; LIGHT REFLECTION; PHOTOLITHOGRAPHY; PHOTORESISTORS; PLASMAS; POLYMERS; REACTIVE ION ETCHING; THICKNESS MEASUREMENT;

ORGANIC FILMS; RF FREQUENCY; SELF-BIAS VOLTAGE;

THIN FILMS;

EID: 9144252302 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.6413 Document Type: Article

Times cited : (10)

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