Destructive abatement of CF4 and C2F6 via a plasma induced reaction with CaO

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2664-2666

  Delattre, James L ^a   Friedman, Todd L ^a,b   Stacy, Angelica M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039523436     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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