Multi-scale modelling of nano-imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Mendels, David A ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

Finite elements multi scale modelling; Load instrumented NIL; Nano imprint lithography; Nanorheology

Indexed keywords

COMPUTER SIMULATION; MATHEMATICAL MODELS; NANOTECHNOLOGY; SILICON WAFERS; VISCOSITY MEASUREMENT;

FINITE ELEMENTS MULTI-SCALE MODELLING; LOAD INSTRUMENTED NIL; NANO-IMPRINT LITHOGRAPHY; NANORHEOLOGY;

LITHOGRAPHY;

EID: 33745625329     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656668     Document Type: Conference Paper

References (18)

1. C. Sotomayor-Torres, S. Zankovych, J. Seekamp, A. Kam, C. Clavijo Cedeño, T. Hoffmann, J. Ahopelto, F. Reuther, K. Pfeiffer, G. Bleidiessel, G. Gruetzner, M. Maximov, and B. Heidari, "Nanoimprint lithography: An alternative nanofabrication approach," Mater. Sci. Eng. C23, pp. 23-31, 2003.
2. S. Chou, P. Krauss, and P. Renstrom, "Imprint of sub-25 nm vias and trenches in polymers," Appl. Phys. Lett. 67, pp. 3114-3116, 1995.
3. S. Chou, P. Krauss, W. Zhang, L. Guo, and L. Zhuang, "Sub-10 nm imprint lithography and applications," J. Vac. Sci. Technol. B 15, pp. 2897-2904, 1997.
4. M. Li, L. Chen, W. Zhang, and S. Chou, "Pattern transfer fidelity of nanoimprint lithography on six-inch wafers," Nanotechnology 14, pp. 33-36, 2003.
5. S. Zankovych, T. Hoffmann, J. Seekamp, J.-U. Bruch, and C. Sotomayor-Torres, "Nanoimprint lithography: Challenges and prospects," Nanotechnology 12, pp. 91-95, 2001.
6. H. Schift and L. Heyderman, Nanorheology - squeezed flow in hot embossing of thin films, vol. Alternative Lithography - Unleashing the Potential of Nanotechnology, Volume editor C. Sotomayor Torres of Nanostructure Science and Technology, pp. 46-76. Kluwer Academic/Plenum Publishers, 2003.
7. H. Langhaar, "Steady flow in the transition length of a straight tube," J. Appl. Mech. 9, pp. A55-58, 1942.
8. H. Rowland, A. Sun, P. Schunk, and W. King, "Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography," J. Micromech. Microeng. 15, pp. 2414-2425, 2005.
9. J.-H. Jeong, Y.-S. Choi, Y.-J. Shin, J.-J. Lee, K.-T. Park, E.-S. Lee, and S.-R. Lee, "Flow behavior at the embossing stage of nanoimprint lithography," Fib. Polym. 3, pp. 113-119, 2002.
10. J.-A. E. Månson, M. Wakeman, and N. Bernet, Composite Manufacturing and Processing - An Overview, vol. 2 of Comprehensive Composite Materials, A. Kelly and C. Zweben Eds., ch. 13, pp. 577-607. Elsevier Science, London, R. Talreja and J.-A. E. Månson ed., 2000.
11. P. deGennes, "Solvent evaporation of spin cast films: "crust" effects," Eur. Phys. J. E 7, pp. 31-34, 2002.
12. K. Suh and P. Kim, "Capillary kinetics of thin polymer films in permeable microcavities," Appl. Phys. Lett. 85, pp. 4019-4021, 2004.
13. T. Nielsen, D. Nilsson, F. Bundgaard, P. Shi, P. anf Szabo, O. Geschke, and A. Kristensen, "Nanoimprint lithography in the cyclic olefin copolymer, topas, a highly ultraviolet-transparent and chemically resistant thermoplast," J. Vac. Sci. Technol. B 22, pp. 1770-1775, 2004.
14. S. Goudeau, J. Galy, J. Gerard, R. Fulchiron, and J. Barrat, "Modelling surface properties of linear amorphous polymers," Mat. Res. Soc. Symp. 629, pp. FF9.2.1-6, 2000.
15. N. Lee, Y. Kim, and S. Kang, "Temperature dependence of anti-adhesion between a stamper with sub-micron patterns and the polymer in nano-moulding process," J. Phys. D.: Appl. Phys. 37, pp. 1624-1629, 2004.
16. B. O'Connell, G. Cross, J. Pethica, and W. Oliver, "Nanorheology of squeezed polymer films," in Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on, pp. 793-796 vol. 2, 12-14 Aug. 2003.
17. G. Cross, B. O'Connel, and J. Pethica, "Influence of elastic strains on the mask ratio in glassy polymer nanoimprint," Appl. Phys. Lett. 86, p. 081902, 2005.
18. G. Cross, R. Langford, B. O'Connel, and J. Pethica, "The mechanics of nanoimprint forming," in Mat. Res. Soc. Symp. Proc., M. R. Society, ed., 841, pp. R1.6.1-12, 2005.