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Volumn 2, Issue , 2003, Pages 793-796

Nanorheology of squeezed polymer films

Author keywords

Embossing; Milling; Polymer films; Printing; Residual stresses; Shape; Silicon; Substrates; Temperature; Tungsten

Indexed keywords

GLASS TRANSITION; MILLING (MACHINING); NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; POLYMERS; PRINTING; RESIDUAL STRESSES; SEMICONDUCTING FILMS; SILICON; STRESS RELAXATION; SUBSTRATES; TEMPERATURE; TUNGSTEN;

EID: 32044458727     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2003.1231033     Document Type: Conference Paper
Times cited : (5)

References (8)
  • 1
    • 0030570065 scopus 로고    scopus 로고
    • Imprint lithography with 25-nanometer resolution
    • S. Y. Chou, P. R. Krauss, and P. J. Renstrom. Imprint lithography with 25-nanometer resolution. Science, 272:85-87, 1996.
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 4
    • 0037142072 scopus 로고    scopus 로고
    • Ultrafast and direct imprint of nanostructures in silicon
    • S. Y. Chou, C. Keimel, and J. Gu. Ultrafast and direct imprint of nanostructures in silicon. Nature, 417:835-837, 2002.
    • (2002) Nature , vol.417 , pp. 835-837
    • Chou, S.Y.1    Keimel, C.2    Gu, J.3
  • 5
    • 0037459370 scopus 로고    scopus 로고
    • Self Aligned, Vertical Channel, Polymer Field-Effect Transistors
    • N. Stutzmann and R. H. Friend and H. Sirringhaus Self Aligned, Vertical Channel, Polymer Field-Effect Transistors. Science, 299:1881-1884, 2003.
    • (2003) Science , vol.299 , pp. 1881-1884
    • Stutzmann, N.1    Friend, R.H.2    Sirringhaus, H.3
  • 7
    • 0035422490 scopus 로고    scopus 로고
    • A contribution to the flow behaviour of thin polymer films during hot embossing lithography
    • H. C. Scheer and H. Schulz. A contribution to the flow behaviour of thin polymer films during hot embossing lithography. Microelect. Eng., 56:311-332, 2001.
    • (2001) Microelect. Eng. , vol.56 , pp. 311-332
    • Scheer, H.C.1    Schulz, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.