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Volumn 2, Issue , 2003, Pages 793-796
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Nanorheology of squeezed polymer films
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Author keywords
Embossing; Milling; Polymer films; Printing; Residual stresses; Shape; Silicon; Substrates; Temperature; Tungsten
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Indexed keywords
GLASS TRANSITION;
MILLING (MACHINING);
NANOIMPRINT LITHOGRAPHY;
NANOTECHNOLOGY;
POLYMERS;
PRINTING;
RESIDUAL STRESSES;
SEMICONDUCTING FILMS;
SILICON;
STRESS RELAXATION;
SUBSTRATES;
TEMPERATURE;
TUNGSTEN;
EMBOSSING;
MECHANICAL CHARACTERISTICS;
QUASI TWO-DIMENSIONAL FLOW;
SHAPE;
SPHERICAL INDENTERS;
SUBSTRATE DEFORMATION;
THIN POLYMER FILMS;
TRANSITION REGIONS;
POLYMER FILMS;
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EID: 32044458727
PISSN: 19449399
EISSN: 19449380
Source Type: Conference Proceeding
DOI: 10.1109/NANO.2003.1231033 Document Type: Conference Paper |
Times cited : (5)
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References (8)
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