Exposure parameters for MeV proton beam writing on SU-8

Microelectronic Engineering

Volumn 83, Issue 10, 2006, Pages 2015-2020

  Auzelyte, Vaida ^a   Elfman, Mikael ^a   Kristiansson, Per ^a   Nilsson, Christer ^a   Pallon, Jan ^a   Marrero, Natalia Arteaga ^a   Wegdén, Marie ^a  

^a LUND INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

Aspect ratio; Exposure latitude; Lithography; Microfabrication; Pattern density; Proton beam writing

Indexed keywords

ASPECT RATIO; DENSITY MEASUREMENT (OPTICAL); IRRADIATION; LITHOGRAPHY; PROTON BEAMS; THICKNESS MEASUREMENT; EXPOSURE CONTROLS; FEATURE EXTRACTION; PARAMETER ESTIMATION;

EXPOSURE LATITUDE; PATTERN DENSITY; PROXIMITY CORRECTION; STRUCTURE-SPACE RATIO; SU-8 NEGATIVE RESIST; EXPOSURE LATITUDES; MICROFABRICATION; PROTON BEAM WRITING;

MICROELECTROMECHANICAL DEVICES; PROTON BEAMS;

EID: 33745150043     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.04.001     Document Type: Article

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