Status and future of x-ray lithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 25-30

  Hector, Scott ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY;

130 NM GROUND RULES;

X RAY LITHOGRAPHY;

EID: 4243891784     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00007-0     Document Type: Article

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