Effect of electron beam treatment on adhesion of Ta/polymeric low- k interface

Applied Physics Letters

Volumn 88, Issue 23, 2006, Pages

  Gan, Zhenghao ^a   Chen, Zhong ^a   Mhaisalkar, S G ^a   Damayanti, M ^a   Chen, Zhe ^b   Prasad, K ^b   Zhang, Sam ^c   Ning, Jiang ^d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DIELECTRIC MATERIALS; INTERFACES (MATERIALS); INTERFACIAL ENERGY; TANTALUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ADHESION ENERGY; AROMATIC RINGS; ELECTRON BEAM (EB); TA/POLYMERIC LOW- K INTERFACE;

ELECTRON BEAM LITHOGRAPHY;

EID: 33745041930     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2212533     Document Type: Article

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