In situ x-ray photoelectron spectroscopy measurement during Ta deposition on low-k dielectric SiLK™

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1513-1515

  Uchibori, Chihiro J ^a   Kimura, Takahiro ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC COMPOUNDS; CARBON; INTEGRATED CIRCUITS; INTERFACES (MATERIALS); PERMITTIVITY; SILICON COMPOUNDS; TANTALUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRALARGE SCALE INTEGRATED CIRCUITS (ULSI);

CHEMICAL BONDS;

EID: 0141793049     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1596218     Document Type: Conference Paper

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