Transition from unstable electrostatic confinement to stable magnetic confinement in a helicon reactor operating with ArS F6 gas mixtures

Journal of Applied Physics

Volumn 99, Issue 10, 2006, Pages

  Corr, C S ^a,b   Plihon, N ^a   Chabert, P ^a  

^a ECOLE POLYTECHNIQUE   (France)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; DIFFUSION; ELECTROSTATICS; MAGNETIC FIELDS; MIXTURES; NEGATIVE IONS; WAVE PROPAGATION;

ELECTRONEGATIVITY; ELECTROSTATIC BARRIER; ELECTROSTATIC CONFINEMENT; GAS MIXTURES; HELICON REACTOR; HELICON WAVE PROPAGATION; MAGNETIC CONFINEMENT;

HELICONS;

EID: 33744803509     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2191431     Document Type: Article

References (26)

1. R. W. Boswell, Plasma Phys. Controlled Fusion 26, 1147 (1984).
2. N. Plihon, C. S. Corr, and P. Chabert, J. Appl. Phys. 98, 023306 (2005).
3. N. Plihon, C. S. Corr, and P. Chabert, Appl. Phys. Lett. 86, 091501 (2004).
4. M. A. Lieberman, A. J. Lichtenberg, and A. M. Marakhtanov, Appl. Phys. Lett. 75, 3617 (1999).
5. P. Chabert, A. J. Lichtenberg, M. A. Lieberman, and A. M. Marakhtanov, Plasma Sources Sci. Technol. 10, 478 (2001).
6. A. J. Lichtenberg, P. Chabert, M. A. Lieberman, and A. M. Markhtanov, Bifurcation Phenomena in Plasmas (2001), p. 3.
7. P. Chabert, H. Abada, J. P. Booth, and M. A. Lieberman, J. Appl. Phys. 94, 76 (2003).
8. P. Chabert, A. J. Lichtenberg, M. Lieberman, and A. M. Marakhtanov, J. Appl. Phys. 94, 831 (2003).
9. M. Tuszewski and R. R. White, J. Appl. Phys. 94, 2858 (2003).
10. M. Tuszewski, R. R. White, and G. A. Wurden, Plasma Sources Sci. Technol. 12, 396 (2003).
11. A. M. Marakhtanov, M. Tuszewski, M. A. L. A. J. Lichtenberg, and P. Chabert, J. Vac. Sci. Technol. A 21, 1849 (2003).
12. C. S. Corr, P. G. Steen, and W. G. Graham, Plasma Sources Sci. Technol. 12, 265 (2003).
13. C. S. Corr, P. G. Steen, and W. G. Graham, Appl. Phys. Lett. 86, 141503 (2005).
14. R. Kawai and T. Mieno, Jpn. J. Appl. Phys., Part 2 36, L1123 (1997).
15. P. Chabert, T. E. Sheridan, R. W. Boswell, and J. Perrin, Plasma Sources Sci. Technol. 8, 561 (1999).
16. R. N. Franklin and J. Snell, J. Phys. D 32, 1031 (1999).
17. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
18. S. Samukawa, Appl. Phys. Lett. 64, 3398 (1994).
19. R. W. Boswell, Phys. Lett. 33A, 470 (1970).
20. A. Cantin and R. R. R. Gagne, Appl. Phys. Lett. 30, 31 (1977).
21. M. B. Hopkins and W. G. Graham, Rev. Sci. Instrum. 57, 2210 (1986).
22. T. E. Sheridan, P. Chabert, and R. W. Boswell, Plasma Sources Sci. Technol. 8, 457 (1999).
23. M. Tuszewski and R. White, Plasma Sources Sci. Technol. 11, 338 (2002).
24. M. Shindo, S. Uchino, R. Ichiki, S. Yoshimura, and Y. Kawai, Rev. Sci. Instrum. 72, 2288 (2001).
25. L. St-Onge, M. Chaker, and J. Margot, J. Vac. Sci. Technol. A 18, 2363 (2000).
26. S. Raul, P. L. G. Ventzek, I. C. Abraham, G. A. Hebner, and J. R. Woodworth, J. Appl. Phys. 92, 6998 (2002).