Effective production of negative ions around magnetized CF4 plasma column

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 8 SUPPL. B, 1997, Pages

  Kawai, Ryoichi ^a   Mieno, Tetsu ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Carbon tetrafiuoride; Cyclotron resonance mass spectrometer; Dry etching; Fluorine negative ion; Langmuir probe; Magnetized plasma column; Plasma processing

Indexed keywords

CYCLOTRON RESONANCE; DRY ETCHING; FLUORINE COMPOUNDS; MAGNETIC FIELD EFFECTS; MASS SPECTROMETRY; PLASMA APPLICATIONS;

CARBON TETRAFLUORIDE; CYCLOTRON RESONANCE MASS SPECTROMETRY; LANGMUIR PROBE METHOD; MAGNETIZED PLASMA COLUMNS;

IONS;

EID: 0031210362     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l1123     Document Type: Article

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