Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2483-2487

  Osawa, Morimi ^a   Takahashi, Kimitoshi ^a   Sato, Masami ^a   Arimoto, Hiroshi ^a   Ogino, Kozo ^a   Hoshino, Hiromi ^a   Machida, Yasuhide ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; BACKSCATTERING; CALCULATIONS; COMPUTER SIMULATION; NUMERICAL METHODS;

AREA DENSITY MAP; ELECTRON BEAM PROJECTION LITHOGRAPHY; PATTERN SHAPE MODIFICATION; PROXIMITY EFFECT CORRECTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519423     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1410090     Document Type: Article

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