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Volumn 22, Issue 6, 2004, Pages 3339-3343
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Electron-beam SAFIER™ process and its application for magnetic thin-film heads
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Author keywords
[No Author keywords available]
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Indexed keywords
CONTACT HOLES;
CRITICAL DIMENSION (CD);
LINE EDGE ROUGHNESS (LER);
SHRINK ASSIST FILM FOR ENHANCED RESOLUTION (SAFIER™);
CATALYSTS;
CROSSLINKING;
ELECTRON BEAM LITHOGRAPHY;
MAGNETIC HEADS;
MIXING;
SCANNING ELECTRON MICROSCOPY;
MAGNETIC THIN FILM DEVICES;
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EID: 13244278367
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1815309 Document Type: Conference Paper |
Times cited : (15)
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References (7)
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