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Volumn 17, Issue 11, 2006, Pages

Atmospheric pressure chemical vapour deposition synthesis of sulfides, oxides, silicides and metal nanowires with metal chloride precursors

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; METALS; NANOTECHNOLOGY; OXIDES; SILICON COMPOUNDS; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL); TORSIONAL STRESS;

EID: 33744533181     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/11/S05     Document Type: Article
Times cited : (15)

References (63)
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    • (2000) Adv. Mater. , vol.12 , Issue.4 , pp. 298
    • Duan, X.F.1    Lieber, C.M.2
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    • 0038356551 scopus 로고    scopus 로고
    • 10.1016/S0040-6090(03)00166-4 0040-6090
    • Pfisterer F 2003 Thin Solid Films 431/432 470
    • (2003) Thin Solid Films , vol.431-432 , pp. 470
    • Pfisterer, F.1
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.