SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 773-776

Interdiffusion in microstructurally different Si/Al multilayered structures

(4) Wang, J Y a He, D a Zalar, A b Mittemeijer, E J a

a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

b JO EF STEFAN INSTITUTE (Slovenia)

Author keywords

AES depth profiling; Interdiffusion; Si Al multilayered structures

Indexed keywords

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; GRAIN BOUNDARIES; INTERDIFFUSION (SOLIDS); MAGNETRON SPUTTERING; MICROSTRUCTURE; SILICON; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AUGER ELECTRON SPECTROSCOPIC (AES) DEPTH PROFILING; INTERDIFFUSION; INTERFACE ROUGHNESS; SI/AL MULTILAYERED STRUCTURES;

MULTILAYERS;

EID: 33646542716 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.2189 Document Type: Conference Paper

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.