Mechanically tunable three-dimensional elastomeric network/air structures via interference lithography

Nano Letters

Volumn 6, Issue 4, 2006, Pages 740-743

  Jang, Ji Hyun ^a   Ullal, Chaitanya K ^a   Gorishnyy, Taras ^a   Tsukruk, Vladimir V ^b   Thomas, Edwin L ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b Iowa State University of Science and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOMERIC STRUCTURES; INTERFERENCE LITHOGRAPHY; MECHANICAL STRAIN; PATTERN COLLAPSE;

ELASTOMERS; INFILTRATION; NANOSTRUCTURED MATERIALS; PHASE DIAGRAMS; PHOTORESISTORS; STRENGTH OF MATERIALS;

LITHOGRAPHY;

BAYSILON; DIMETICONE; ELASTOMER; NANOMATERIAL; SILICONE DERIVATIVE;

AIR; ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELASTICITY; LIGHT; MATERIALS TESTING; MECHANICAL STRESS; MECHANICS; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOCHEMISTRY; PHOTOGRAPHY; RADIATION SCATTERING; SURFACE PROPERTY; ULTRASTRUCTURE;

AIR; CRYSTALLIZATION; DIMETHYLPOLYSILOXANES; ELASTICITY; ELASTOMERS; LIGHT; MATERIALS TESTING; MECHANICS; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOCHEMISTRY; PHOTOGRAPHY; SCATTERING, RADIATION; SILICONES; STRESS, MECHANICAL; SURFACE PROPERTIES;

EID: 33646408139     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl052577q     Document Type: Article

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