-
1
-
-
0003769722
-
Properties of Lattice-Matched and Strained Indium Gallium Arsenide
-
London, U.K.: INSPEC Inst. Elect. Eng
-
P. Bhattacharya, Properties of Lattice-Matched and Strained Indium Gallium Arsenide. London, U.K.: INSPEC Inst. Elect. Eng., 1993.
-
(1993)
-
-
Bhattacharya, P.1
-
2
-
-
21644474327
-
τ = 350/300 GHz and gate delay below 3.3 ps "
-
San Francisco, CA, Dec. 13-15
-
τ = 350/300 GHz and gate delay below 3.3 ps," in IEDM Tech. Dig., San Francisco, CA, Dec. 13-15, 2004, pp. 247-250.
-
(2004)
IEDM Tech. Dig.
, pp. 247-250
-
-
Khater, M.1
Rieh, J.-S.2
Adam, T.3
Chinthakindi, A.4
Johnson, J.5
Krishnasamy, R.6
Meghelli, M.7
Pagette, F.8
Sanderson, D.9
Schnabel, C.10
Schonenberg, K.T.11
Smith, P.12
Stein, K.13
Stricker, A.14
Jeng, S.-J.15
Ahlgren, D.16
Freeman, G.17
-
3
-
-
33747388311
-
"Self-aligned InP DHBTs for 150 GHz digital and mixed signal circuits"
-
May 8-12
-
M. Le, G. He, R. Hess, P. Partyka, B. Li, R. Bryie, S. Rustomji, G. Kim, R. Lee, J. Pepper, M. Helix, R. Milano, R. Elder, D. Jansen, F. Stroili, J. W. Lai, and M. Feng, "Self-aligned InP DHBTs for 150 GHz digital and mixed signal circuits," in Proc. Int. Conf. Indium Phosphide Relat. Mater., May 8-12, 2005, pp. 325-330.
-
(2005)
Proc. Int. Conf. Indium Phosphide Relat. Mater.
, pp. 325-330
-
-
Le, M.1
He, G.2
Hess, R.3
Partyka, P.4
Li, B.5
Bryie, R.6
Rustomji, S.7
Kim, G.8
Lee, R.9
Pepper, J.10
Helix, M.11
Milano, R.12
Elder, R.13
Jansen, D.14
Stroili, F.15
Lai, J.W.16
Feng, M.17
-
4
-
-
18044373430
-
"Deep submicron InP DHBT technology with electroplated emitter and base contacts"
-
Notre Dame, IL, Jun. 21-23
-
M. Urteaga, P. Rowell, R. Pierson, B. Brar, M. Dahlström, Z. Griffith, M. J. W. Rodwell, S. Lee, N. Nguyen, and C. Nguyen, "Deep submicron InP DHBT technology with electroplated emitter and base contacts," in Proc. IEEE Device Res. Conf., Notre Dame, IL, Jun. 21-23, 2004, pp. 230-240.
-
(2004)
Proc. IEEE Device Res. Conf.
, pp. 230-240
-
-
Urteaga, M.1
Rowell, P.2
Pierson, R.3
Brar, B.4
Dahlström, M.5
Griffith, Z.6
Rodwell, M.J.W.7
Lee, S.8
Nguyen, N.9
Nguyen, C.10
-
5
-
-
21644435770
-
max"
-
San Francisco, CA, Dec. 13-15
-
max," in IEDM Tech. Dig., San Francisco, CA, Dec. 13-15, 2004, pp. 553-556.
-
(2004)
IEDM Tech. Dig.
, pp. 553-556
-
-
Hussain, T.1
Royter, Y.2
Hitko, D.3
Montes, M.4
Madhav, M.5
Milosavljevic, I.6
Rajavel, R.7
Thomas, S.8
Antcliffe, M.9
Arthur, A.10
Boegeman, Y.11
Sokolich, M.12
-
6
-
-
33646266297
-
max > 500 GHz"
-
May 8-12
-
max > 500 GHz," in Proc. Int. Conf. Indium Phosphide Relat. Mater., May 8-12, 2005, pp. 335-338.
-
(2005)
Proc. Int. Conf. Indium Phosphide Relat. Mater.
, pp. 335-338
-
-
Sawdai, D.1
Chang, P.C.2
Gambin, V.3
Zeng, X.4
Wang, J.5
Barsky, M.6
Chan, B.7
Oyama, B.8
Gutierrez-Aitken, A.9
Oki, A.10
-
7
-
-
6644225001
-
"Submicron scaling of HBTs"
-
Nov
-
M. J. W. Rodwell, M. Urteaga, T. Mathew, D. Scott, D. Mensa, Q. Lee, J. Guthrie, Y. Betser, S. C. Martin, R. P. Smith, S. Jaganathan, S. Krishnan, S. I. Long, R. Pullela, B. Agarwal, U. Bhattacharya, L. Samoska, and M. Dahlstrom, "Submicron scaling of HBTs," IEEE Trans. Electron Devices, vol. 48, no. 11, pp. 159-215, Nov. 2001.
-
(2001)
IEEE Trans. Electron Devices
, vol.48
, Issue.11
, pp. 159-215
-
-
Rodwell, M.J.W.1
Urteaga, M.2
Mathew, T.3
Scott, D.4
Mensa, D.5
Lee, Q.6
Guthrie, J.7
Betser, Y.8
Martin, S.C.9
Smith, R.P.10
Jaganathan, S.11
Krishnan, S.12
Long, S.I.13
Pullela, R.14
Agarwal, B.15
Bhattacharya, U.16
Samoska, L.17
Dahlstrom, M.18
-
8
-
-
0033706405
-
BC reduction in GaInAs/InP buried metal heterojunction bipolar transistor"
-
Williamsburg, VA May 14-18
-
BC reduction in GaInAs/InP buried metal heterojunction bipolar transistor," in Proc. Int. Conf. Indium Phosphide Relat. Mater., Williamsburg, VA, May 14-18, 2000, pp. 254-257.
-
(2000)
Proc. Int. Conf. Indium Phosphide Relat. Mater.
, pp. 254-257
-
-
Arai, T.1
Harada, Y.2
Yamagami, S.3
Miyamoto, Y.4
Furuya, K.5
-
9
-
-
84948686594
-
max InP/InGaAs/InP transferred substrate DHBTs"
-
Santa Barbara, CA, Jun. 24-26
-
max InP/InGaAs/InP transferred substrate DHBTs," in Proc. IEEE Device Res. Conf., Santa Barbara, CA, Jun. 24-26, 2002, pp. 107-108.
-
(2002)
Proc. IEEE Device Res. Conf.
, pp. 107-108
-
-
Lee, S.1
Urteaga, M.2
Wei, Y.3
Kim, Y.4
Dahlstrom, M.5
Krishnan, S.6
Rodwell, M.7
-
10
-
-
15544369356
-
MAX InP DHBT with reduced CBC using selectively implanted buried subcollector (SIBS)"
-
Mar
-
MAX InP DHBT with reduced CBC using selectively implanted buried subcollector (SIBS)," IEEE Electron Device Lett., vol. 26, no. 3, pp. 136-138, Mar. 2005.
-
(2005)
IEEE Electron Device Lett.
, vol.26
, Issue.3
, pp. 136-138
-
-
Li, J.C.1
Chen, M.2
Hitko, D.A.3
Fields, C.H.4
Shi, B.5
Rajavel, R.6
Asbeck, P.M.7
Sokolich, M.8
-
11
-
-
18044370246
-
bc reduction in InP heterojunction bipolar transistor with selectively implanted collector pedestal"
-
Jun. 21-23
-
bc reduction in InP heterojunction bipolar transistor with selectively implanted collector pedestal," in Proc. DRC, Jun. 21-23, 2004, vol. 1, pp. 67-68.
-
(2004)
Proc. DRC
, vol.1
, pp. 67-68
-
-
Dong, Y.1
Griffith, Z.2
Dahlstrom, M.3
Rodwell, M.J.W.4
-
12
-
-
0012398837
-
+ structures"
-
Sep. 1
-
+ structures," J. Appl. Phys., vol. 58, no. 5, pp. 1780-1786, Sep. 1, 1985.
-
(1985)
J. Appl. Phys.
, vol.58
, Issue.5
, pp. 1780-1786
-
-
Cheng, J.1
Forrest, S.R.2
Tell, B.3
Wilt, D.4
Schwartz, B.5
Wright, P.D.6
-
13
-
-
0032620140
-
"High-resistance buried layers by MeV Fe implantation in n-type InP"
-
Aug. 2
-
A. Gasparotto, A. Carnera, A. Paccagnella, B. Fraboni, F. Priolo, E. Gombia, and R. Mosca, "High-resistance buried layers by MeV Fe implantation in n-type InP," Appl. Phys. Lett., vol. 75, no. 5, pp. 668-670, Aug. 2, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.75
, Issue.5
, pp. 668-670
-
-
Gasparotto, A.1
Carnera, A.2
Paccagnella, A.3
Fraboni, B.4
Priolo, F.5
Gombia, E.6
Mosca, R.7
-
14
-
-
0004108176
-
-
London, U.K.: INSPEC Inst. Elect. Eng
-
Properties of Indium Phosphide. London, U.K.: INSPEC Inst. Elect. Eng., 1991, pp. 33-35.
-
(1991)
Properties of Indium Phosphide
, pp. 33-35
-
-
-
15
-
-
23844444783
-
max ≥ 450 GHz"
-
Aug
-
max ≥ 450 GHz," IEEE Electron Device Lett., vol. 26, no. 8, pp. 530-532, Aug. 2005.
-
(2005)
IEEE Electron Device Lett.
, vol.26
, Issue.8
, pp. 530-532
-
-
Griffith, Z.1
Rodwell, M.J.W.2
Fang, X.-M.3
Lubyshev, D.4
Wu, Y.5
Fastenau, J.M.6
Liu, W.K.7
|