High-resistance buried layers by MeV Fe implantation in n-type InP

Applied Physics Letters

Volumn 75, Issue 5, 1999, Pages 668-670

  Gasparotto, A ^a   Carnera, A ^a   Paccagnella, A ^a   Fraboni, B ^b   Priolo, F ^c   Gombia, E ^d   Mosca, R ^d  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF BOLOGNA   (Italy)

^c UNIVERSITY OF CATANIA   (Italy)

^d CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY OF SOLIDS; ION IMPLANTATION; IRON; SOLUBILITY;

BURIED LAYERS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0032620140     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124476     Document Type: Article

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