Composition, structure and nanomechanical properties of C-Si-N thin films deposited by ion implantation assisted plasma beam CVD

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6420-6424

  Toth A ^a   Mohai, M ^a   Ujvari T ^a   Bertoti I ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

Diamond like carbon; Mechanical properties; Nitrogen; Plasma immersion ion implantation; Silicon

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; ION IMPLANTATION; MECHANICAL PROPERTIES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOMECHANICAL PROPERTIES; PLASMA IMMERSION ION IMPLANTATION;

DIAMOND LIKE CARBON FILMS;

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; DIAMOND LIKE CARBON FILMS; ION IMPLANTATION; MECHANICAL PROPERTIES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33646164176     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.068     Document Type: Article

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