Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 954-958

  Toth A ^a   Mohai, M ^a   Ujvari T ^a   Bertoti I ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

Diamond like carbon; Mechanical properties; Plasma CVD; Surface characterization

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CYCLOTRONS; HARDNESS; INDENTATION; SILICON WAFERS; SURFACE CHEMISTRY; SURFACE PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND-LIKE CARBON; ELECTRON CYCLOTRON WAVE RESONANCE (ECWR); PLASMA CVD; SURFACE CHARACTERIZATION;

DIAMOND LIKE CARBON FILMS;

EID: 18444388904     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.01.017     Document Type: Conference Paper

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