Nanomechanical properties of silicon-, oxygen- and nitrogen-containing a-C:H films prepared by RF plasma beam CVD

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 188-191

  Toth A ^a   Mohai, M ^a   Ujvari T ^a   Bertoti I ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

Auger parameter; Diamond like carbon; Nanomechanical properties; Plasmon loss; Silicon

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CROSSLINKING; HARDNESS; NITROGEN; RESONANCE; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER PARAMETERS; DIAMOND-LIKE CARBON; NANOMECHANICAL PROPERTIES; PLASMON LOSS;

THIN FILMS;

EID: 17644413211     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.168     Document Type: Conference Paper

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