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Thin Solid Films

Volumn 398-399, Issue , 2001, Pages 591-596

Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

(3) Bica De Moraes, M A a Durrant, S F a Rouxinol, F P a

a UNIVERSITY OF CAMPINAS (Brazil)

Author keywords

Electron emission enhanced CVD; Hexamethyldisiloxane; HFCVD; Plasma polymers; Tetramethylsilane; Thin films; Transmission infrared spectroscopy

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; INFRARED SPECTROSCOPY; MONOMERS; PLASMA POLYMERIZATION; THIN FILMS; VACUUM APPLICATIONS;

ELECTRON IMPACT FRAGMENTATION;

AMORPHOUS FILMS;

EID: 18344402227 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01324-4 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.