Control of misfit dislocations in strain-relaxed SiGe buffer layers on SOI substrates

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 147-151

  Taoka, Noriyuki ^a   Sakai, Akira ^a   Mochizuki, Shogo ^a   Nakatsuka, Osamu ^a   Ogawa, Masaki ^a   Zaima, Shigeaki ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Image force; Mosaicity; Pure edge dislocation; SiGe buffer layer

Indexed keywords

CRYSTALLINE MATERIALS; DISLOCATIONS (CRYSTALS); GERMANIUM; SILICON; SILICON ON INSULATOR TECHNOLOGY; STRAIN RATE;

IMAGE FORCE; MOSAICITY; PURE-EDGE DISLOCATION; SIGE BUFFER LAYER;

THIN FILMS;

EID: 33646115195     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.196     Document Type: Article

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