Analysis of microstructures in SiGe buffer layers on silicon-on-insulator substrates

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 10, 2005, Pages 7356-7363

  Taoka, Noriyuki ^a   Sakai, Akira ^a   Mochizuki, Shogo ^a   Nakatsuka, Osamu ^a   Ogawa, Masaki ^a   Zaima, Shigeaki ^a   Tezuka, Tsutomu ^b   Sugiyama, Naoharu ^b   Takagi, Shin Ichi ^b,c  

^a NAGOYA UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Buffer layer; Mosaicity; Pure edge dislocation; SiGe; Silicon on insulator

Indexed keywords

DISLOCATIONS (CRYSTALS); MORPHOLOGY; SILICON COMPOUNDS; STRAIN RATE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

BUFFER LAYER; MOSAICITY; PURE-EDGE DISLOCATION; SIGE; SILICON ON INSULATOR;

MICROSTRUCTURE;

EID: 31544441654     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.7356     Document Type: Article

References (14)

1. S. Takagi, T. Mizuno, N. Sugiyama, T. Tezuka and A. Kurobe: IEICE Trans. Electron. E84-C (2001) 1043.
2. T. Mizuno, S. Takagi, N. Sugiyama, H. Satake, A. Kurobe and A. Toriumi: IEEE Electron Device Lett. 21 (2000) 230.
3. S. Fukatsu, Y. Ishikawa, T. Saito and N. Shibata: Appl. Phys. Lett. 72 (1998) 3485.
4. N. Sugiyama, T. Mizuno, S. Takagi, M. Koike and A. Kurobe: Thin Solid Films 369 (2000) 199.
5. L. J. Huang, J. O. Chu, D. F. Canaperi, C. P. D'Emic, R. M. Anderson, S. J. Koester and H. S. Philip Wong: Appl. Phys. Lett. 78 (2001) 1267.
6. G. Taraschi, T. A. Langdo, M. T. Currie and E. A. Fitzgerald: J. Vac. Sci. Technol. B 20 (2002) 725.
7. N. Sugii, S. Yamaguchi and K. Washio: J. Vac. Sci. Technol. B 20 (2002) 1891.
8. T. Tezuka, N. Sugiyama, T. Mizuno, M. Suzuki and S. Takagi: Jpn. J. Appl. Phys. 40 (2001) 2866.
9. P. M. Mooney. F. K. LeGoues, J. O. Chu and S. F. Nelson: Appl. Phys. Lett. 62 (1993) 3464.
10. N. Taoka, A. Sakai, T. Egawa, O. Nakatsuka, S. Zaima and Y. Yasuda: Mater. Sci. Semicond. Process. 8 (2005) 131.
11. E. P. EerNisse and G. F. Derbenwick: IEEE Trans. Nucl. Sci. 23 (1976) 1534.
12. L. B. Freund and S. Suresh: Thin Film Materials (Cambridge University Press, Cambridge, 2003) p. 94.
13. A. Sakai, T. Tatsumi and K. Aoyama: Appl. Phys. Lett. 71 (1997) 3510.
14. P. F. Fewster: X-Ray Scattering from Semiconductors (Imperial College Press, London, 2000) p. 261.