Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1132-1137

  Ko, Fu Hsiang ^a   Chen, Jem Kun ^a   Chang, Feng Chih ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Electron beam technology; Plasma treatment; Surface oblique structure

Indexed keywords

ELECTRON BEAMS; ETCHING; HYDROPHOBICITY; SENSITIVITY ANALYSIS; SILICON WAFERS; THERMODYNAMIC STABILITY;

ELECTRON BEAM TECHNOLOGY; PLASMA TREATMENT; SURFACE OBLIQUE STRUCTURE;

POLYMERS;

EID: 33646065978     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.027     Document Type: Article

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